Ever smaller circuits require ever newer exposure processes at the limits of what is technically feasible: the current spearhead is EUV lithography, which uses electromagnetic radiation with very short wavelengths. Systems that produce chips using such processes are assembled and operated in clean rooms of the highest quality. The radiation is generated in a vacuum. Both areas share a sensitivity to impurities. Particulate and filmic impurities can severely impair the production process. Components for the construction of these state-of-the-art production systems must therefore meet the highest standards.

With its systems, TREAMS supplements ultra-fine and ultra-fine cleaning lines with ovens for dry cleaning (VOBOS or VOBOS pro). Baking the components under vacuum and at high temperatures significantly improves cleanliness after wet cleaning. Residual gas analysis systems to verify component cleanliness are sometimes mandatory. Our ARGAT® systems provide you with a fully automatic complete solution. We can also implement combination systems of both types.